The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2026
Filed:
Jan. 27, 2021
Applicant:
Mitsubishi Electric Corporation, Tokyo, JP;
Inventors:
Koichiro Nishizawa, Tokyo, JP;
Daisuke Tsunami, Tokyo, JP;
Assignee:
Mitsubishi Electric Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10P 14/46 (2026.01); H10D 30/01 (2025.01); H10D 30/67 (2025.01); H10D 62/85 (2025.01); H10D 64/01 (2025.01); H10D 64/27 (2025.01); H10D 64/64 (2025.01); H10P 50/64 (2026.01); H10P 70/00 (2026.01);
U.S. Cl.
CPC ...
H10P 14/46 (2026.01); H10D 30/0616 (2025.01); H10D 30/6738 (2025.01); H10D 30/675 (2025.01); H10D 62/85 (2025.01); H10D 64/01 (2025.01); H10D 64/411 (2025.01); H10D 64/64 (2025.01); H10P 50/646 (2026.01); H10P 70/23 (2026.01); H10P 70/273 (2026.01);
Abstract
A substrate () having a GaN surface () is immersed in a catalyst metal solution () containing, potassium hydroxide and a plating catalyst metal salt while being irradiated with ultraviolet light to deposit a catalyst metal () on the GaN surface (). A metal film () is formed on the GaN surface () having the catalyst metal () deposited thereon by electroless plating.