The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 07, 2026

Filed:

Jan. 02, 2024
Applicant:

Samsung Display Co., Ltd., Yongin-si, KR;

Inventors:

Sukyoung Yang, Yongin-si, KR;

Joonyong Park, Yongin-si, KR;

Hyuneok Shin, Yongin-si, KR;

Dongmin Lee, Yongin-si, KR;

Assignee:

SAMSUNG DISPLAY CO., LTD., Gyeonggi-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10K 59/12 (2023.01); H10K 59/122 (2023.01);
U.S. Cl.
CPC ...
H10K 59/1201 (2023.02); H10K 59/122 (2023.02);
Abstract

A method of manufacturing a display apparatus includes: forming a subpixel electrode; forming a conductive bank layer including a first opening overlapping the subpixel electrode, disposed over the subpixel electrode; forming an insulating layer between a peripheral portion of the subpixel electrode and the conductive bank layer and including an opening overlapping the first opening; forming an intermediate layer overlapping the subpixel electrode; forming an opposite electrode overlapping the subpixel electrode; continuously arranging an inorganic passivation layer-forming material on the opposite electrode and the conductive bank layer; forming, on a portion of the inorganic passivation layer-forming material, a first metal layer and a second metal layer, which overlap the first opening; and forming an inorganic passivation layer by etching a portion of the inorganic passivation layer-forming material, which does not overlap the first metal layer and the second metal layer, by using the first and second metal layers as masks.


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