The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2026
Filed:
Feb. 03, 2023
Applicant:
Kioxia Corporation, Tokyo, JP;
Inventors:
Takeharu Motokawa, Zushi Kanagawa, JP;
Noriko Sakurai, Yokohama Kanagawa, JP;
Hideaki Sakurai, Kawasaki Kanagawa, JP;
Assignee:
Kioxia Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C01B 32/05 (2017.01); G03F 1/58 (2012.01); G03F 1/80 (2012.01);
U.S. Cl.
CPC ...
H01J 37/32412 (2013.01); C01B 32/05 (2017.08); G03F 1/58 (2013.01); G03F 1/80 (2013.01); H01J 37/32055 (2013.01); H01J 37/32357 (2013.01); H01J 37/32449 (2013.01); H01J 37/32743 (2013.01); C01P 2002/02 (2013.01); H01J 37/32669 (2013.01); H01J 2237/20235 (2013.01); H01J 2237/20278 (2013.01); H01J 2237/24578 (2013.01); H01J 2237/332 (2013.01); H01J 2237/334 (2013.01); H01J 2237/3365 (2013.01);
Abstract
A target processing method includes: importing a target into a processing chamber; forming a film including carbon on the target using at least one of first ion including carbon and a first plasma including carbon; and removing the film by a reaction between a second plasma and the film, wherein the forming of the film and the removing of the film are alternately performed a number of times in the processing chamber without removing the target from the processing chamber.