The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2026
Filed:
May. 13, 2021
Hitachi High-tech Corporation, Tokyo, JP;
Michiko Suzuki, Tokyo, JP;
Yudai Kubo, Tokyo, JP;
Hitachi High-Tech Corporation, Tokyo, JP;
Abstract
An object of the invention is to efficiently execute aberration correction in an electron microscope including an aberration corrector that corrects aberration using a multipole lens. The electron microscope according to the invention includes an aberration corrector that includes first and second multipole lenses, a transfer lens, and an adjustment lens, in which the first multipole lens is configured to correct third-order spherical aberration by adjusting a lens current, and third-order spherical aberration and fifth-order spherical aberration are collectively corrected by adjusting a transfer lens current while changing an adjustment lens current (refer to FIG.).
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile