The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 07, 2026

Filed:

Jun. 15, 2022
Applicant:

Nikon-essilor Co., Ltd., Tokyo, JP;

Inventor:

Naoshi Aikawa, Fujisawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02C 7/02 (2006.01); G02C 7/06 (2006.01);
U.S. Cl.
CPC ...
G02C 7/027 (2013.01); G02C 7/06 (2013.01);
Abstract

An ophthalmic lens design method includes: acquiring first information about a purpose of an ophthalmic lens; acquiring second information about at least one of a visual line of a wearer for the purpose, a place, a use tool, and a body of the wearer; acquiring data indicating a number of first regions, positions, shapes, and sizes of a plurality of first regions set on a surface of the ophthalmic lens, and distances to a target viewed through the first regions; setting a variable numerical value among numerical values indicating the number of first regions, the positions, the shapes, and the sizes of the plurality of first regions, and the distances in the data and setting the plurality of first regions and the distances on the surface; and setting a target aberration distribution based on the plurality of first regions and the distances that have been set.


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