The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2026
Filed:
Jan. 11, 2021
Ofs Fitel, Llc, Norcross, GA (US);
Andrei A Stolov, Simsbury, CT (US);
Paul S Westbrook, Bridgewater, NJ (US);
OFS Fitel, LLC, Norcross, GA (US);
Abstract
Described herein are systems, methods, and articles of manufacture for a spatially nonuniform scattering profile along its length, whose backscattering signal can be used for sensing even after fiber attenuation increases due to the conditions in the sensing environment. In one embodiment, the fiber has been pre-exposed to the conditions that produce attenuation, and the spatially nonuniform profile compensates for this. Subsequent exposure then results in very little or at least acceptable levels of additional attenuation. An exemplary fiber comprises a fiber length and an optical back scatter along the fiber length greater than a Rayleigh back scattering over the fiber length, wherein the optical back scatter does not decrease along the fiber length by more than 3 dB after exposure to a hydrogen-rich first environment having a given pressure and temperature. An exemplary method comprises drawing a fiber, applying a UV coating, post-processing the fiber using an interferogram, measuring optical back scatter enhancement dependence based on a UV dosage, incrementally increasing the reflectivity, exposing the fiber to a hydrogen-rich first environment.