The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 07, 2026

Filed:

Jul. 22, 2022
Applicant:

Korea Institute of Machinery & Materials, Daejeon, KR;

Inventors:

Dae-Hwan Kim, Daejeon, KR;

Gyubaek Cho, Daejeon, KR;

Seung-Hoon Bae, Gimhae-si, KR;

Tae Kook Park, Sejong, KR;

Dae Won Cho, Busan, KR;

Sunmin Kim, Daejeon, KR;

Jae-Hyung Kim, Daejeon, KR;

Sang Hyuk Lee, Sejong, KR;

Sang Kyo Kim, Daejeon, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F17C 5/06 (2006.01);
U.S. Cl.
CPC ...
F17C 5/06 (2013.01); F17C 2221/012 (2013.01); F17C 2223/0123 (2013.01); F17C 2223/036 (2013.01); F17C 2250/043 (2013.01); F17C 2250/0439 (2013.01);
Abstract

In a high pressure gas charging system and method, the system includes a charging container, a fluid supply part and a high pressure charging part. A high pressure gas is charged in the charging container. The fluid supply part is connected to a first side of the charging container, and is configured to supply incompressible fluid into the charging container before charging the high pressure gas. The high pressure charging part is connected to a second side of the charging container, and is configured to charge the high pressure gas into the charging container in which the incompressible fluid is already supplied. The incompressible fluid is supplied to the charging container until an inner pressure of the charging container reaches a predetermined pressure, and the incompressible fluid is removed to outside through the fluid supply part as the high pressure gas is charged into the charging container.


Find Patent Forward Citations

Kim, Dae-Hwan. (2026). High pressure gas charging system and high pressure gas charging method using the same (U.S. Patent No. 12674547). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12674547

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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