The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 07, 2026

Filed:

Jan. 28, 2022
Applicant:

Kokusai Electric Corporation, Tokyo, JP;

Inventors:

Yuji Takebayashi, Toyama, JP;

Kenji Ono, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/52 (2006.01); C23C 16/44 (2006.01); C23C 16/458 (2006.01); H10P 72/76 (2026.01);
U.S. Cl.
CPC ...
C23C 16/52 (2013.01); C23C 16/4412 (2013.01); C23C 16/4583 (2013.01); H10P 72/7618 (2026.01);
Abstract

There is provided a technique that includes: a process container in which a substrate is processed; a support configured to support the substrate in the process container; a gas flow controller configured to form a gas flow capable of making contact with the substrate in the process container; a first actuator configured to allow the support to reciprocate in the process container; and a second actuator configured to allow the gas flow controller to reciprocate in the process container in a direction opposite to a moving direction of the support.


Find Patent Forward Citations

Takebayashi, Yuji. (2026). Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium (U.S. Patent No. 12674235). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12674235

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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