The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 07, 2026

Filed:

Jun. 14, 2023
Applicant:

Infineon Technologies Ag, Neubiberg, DE;

Inventors:

Christian Bretthauer, Munich, DE;

Marco Haubold, Dresden, DE;

Hans-Jörg Timme, Ottobrunn, DE;

Dominik Mayrhofer, Graz, AT;

Assignee:

Infineon Technologies AG, Neubiberg, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B81B 3/00 (2006.01); H04R 19/02 (2006.01);
U.S. Cl.
CPC ...
B81B 3/0021 (2013.01); B81B 3/007 (2013.01); H04R 19/02 (2013.01); B81B 2201/0257 (2013.01); B81B 2201/036 (2013.01); B81B 2203/0127 (2013.01); B81B 2203/06 (2013.01); H04R 2201/003 (2013.01);
Abstract

A MEMS device includes a substrate having a cavity and a membrane structure mechanically connected to the substrate and configured for deflecting out-of-plane with regard to a substrate plane and with a frequency in an ultrasonic frequency range to cause a fluid motion of the fluid in the cavity. The MEMS device includes a valve structure sandwiching the cavity together with the membrane structure, wherein the valve structure includes a planar perforated structure and a shutter structure opposing the perforated structure and arranged movably in-plane and with a frequency in the ultrasonic frequency range and with regard to the substrate plane and between a first position and a second position. The shutter structure is arranged to provide a first fluidic resistance for the fluid in the first position and a second, higher fluidic resistance for the fluid in the second position.


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