The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 07, 2026

Filed:

Nov. 20, 2023
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Jagan Rangarajan, San Jose, CA (US);

Edward Golubovsky, San Jose, CA (US);

Edwin Valazquez, San Jose, CA (US);

Adrian S. Blank, Gilroy, CA (US);

Steven M. Zuniga, Soquel, CA (US);

Balasubramaniam C. Jagannathan, Bangalore, IN;

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B25J 11/00 (2006.01); B25J 9/04 (2006.01); B25J 15/02 (2006.01);
U.S. Cl.
CPC ...
B25J 11/0095 (2013.01); B25J 9/042 (2013.01); B25J 11/0085 (2013.01); B25J 15/0206 (2013.01);
Abstract

Equipment is used in the manufacturing of electronic devices, and more particularly, to a cleaning system, cleaning system hardware and related methods which may be used to transport and clean the surface of a substrate. According to one embodiment, a substrate cleaning unit may include a pre-clean chamber that performs a pre-clean process on a substrate with the substrate in a horizontal orientation. The unit may also include a first cleaning chamber that performs a first cleaning process on the substrate with the substrate in a vertical orientation. The unit may also include a second cleaning chamber. The unit may also include an integrated cleaning and drying chamber that performs a cleaning and drying process on the substrate in the horizontal orientation. A substrate handler may transfer the substrate between the chambers. The first and second cleaning chambers may be positioned below the pre-clean chamber.


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