The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 30, 2026

Filed:

Jun. 04, 2024
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Vikram M. Bhosle, North Reading, MA (US);

Deven Raj Mittal, Middleton, MA (US);

Manohar Harsha Karigerasi, Sunnyvale, CA (US);

Sarah Michelle Bobek, Santa Clara, CA (US);

Abdul Aziz Khaja, Morgan Hill, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10P 76/40 (2026.01); H10P 30/20 (2026.01); H10P 50/00 (2026.01); H10P 76/20 (2026.01);
U.S. Cl.
CPC ...
H10P 76/4085 (2026.01); H10P 30/204 (2026.01); H10P 30/21 (2026.01); H10P 50/71 (2026.01); H10P 76/20 (2026.01);
Abstract

Provided herein are devices and techniques for using a low-energy implant for hard mask stress modulation. In one approach, a method may include providing a stack of mandrel film layers, implanting an upper layer of the stack of mandrel film layers, and forming a mask film layer over the upper layer. The method may further include forming a patterning layer over the mask film layer, partially removing the patterning layer and the mask film layer, and patterning the stack of mandrel film layers to form a set of vertical features.


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