The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 2026
Filed:
Jun. 20, 2024
Research & Business Foundation Sungkyunkwan University, Suwon-si, KR;
Sung Joo Lee, Seongnam-si, KR;
Tae Ho Kang, Seoul, KR;
Hae Ju Choi, Suwon-si, KR;
Jong Wook Jeon, Suwon-si, KR;
Sung Pyo Baek, Suwon-si, KR;
Sang Min Lee, Suwon-si, KR;
Cheol Hwa Jang, Suwon-si, KR;
Jong Min Noh, Suwon-si, KR;
Seong Kweon Kang, Suwon-si, KR;
Na Yeong Lee, Suwon-si, KR;
RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY, Suwon-si, KR;
Abstract
Provided is a method for manufacturing a stack structure. The method for manufacturing a stack structure includes: preparing a substrate; forming a two-dimensional semiconductor material on the substrate; and oxidizing the two-dimensional semiconductor material using oxygen plasma to form a high-k material layer including the high-k material. The stack structure manufactured through the above-described method may be easily applied to a MOS capacitor, a field effect transistor (FET), an impact ionization super-tilt switching device, a dye-sensitized solar cell, an architectural film (particularly, a film used for window coating), and the like.