The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 2026
Filed:
Jan. 22, 2021
Hitachi High-tech Corporation, Tokyo, JP;
Shota Aida, Tokyo, JP;
Hisayuki Takasu, Tokyo, JP;
Atsushi Kamino, Tokyo, JP;
Hitoshi Kamoshida, Tokyo, JP;
Hitachi High-Tech Corporation, Tokyo, JP;
Abstract
In order to improve the processing reproducibility, an ion milling deviceincludes a sample chamber, a sample stagethat is disposed in the sample chamber on which a sample is placed, an ion sourcethat emits an unfocused ion beam toward the sample, a control unitthat controls an output of the ion beam, an oscillatorthat is disposed in the sample chamber, and an oscillation circuitthat oscillates the oscillator and outputs an oscillation signal to the control unit, in which the control unit controls the output of the ion beam such that a vibrational frequency change amount of the oscillator per unit time due to deposition of sputtered particles generated by irradiating the sample with the ion beam on the oscillator is kept within a predetermined range.