The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 30, 2026

Filed:

Nov. 30, 2021
Applicants:

Beijing Boe Technology Development Co., Ltd., Beijing, CN;

Boe Technology Group Co., Ltd., Beijing, CN;

Inventors:

Chao Ji, Beijing, CN;

Yaoping Wang, Beijing, CN;

Hongxiang Shen, Beijing, CN;

Ge Ou, Beijing, CN;

Boran Jiang, Beijing, CN;

Shuqi Wei, Beijing, CN;

Chuqian Zhong, Beijing, CN;

Pengfei Zhang, Beijing, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01);
U.S. Cl.
CPC ...
G06T 7/0004 (2013.01); G06T 2207/20021 (2013.01); G06T 2207/20081 (2013.01); G06T 2207/20084 (2013.01); G06T 2207/30121 (2013.01);
Abstract

An image recognition method and system for a display panel, a training method, and an electronic device and a non-volatile computer-readable storage medium. The image recognition method includes: acquiring an image of a display panel, wherein the image includes gate lines extending in a first direction and data lines extending in a second direction, the gate lines and the data lines intersecting to define a plurality of sub-pixel regions, and the image further includes a defect pattern; and recognizing the defect pattern in the image by using an image recognition model to obtain defect information, wherein the defect information includes at least one of a defect type or a defect position of the defect pattern, the image recognition model comprises a first attention model configured to learn a weight proportion of a feature of the defect pattern in the image.


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