The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 30, 2026

Filed:

Sep. 18, 2023
Applicant:

Fujifilm Business Innovation Corp., Tokyo, JP;

Inventors:

Mai Mochida, Kanagawa, JP;

Sakae Takeuchi, Kanagawa, JP;

Yuka Zenitani, Kanagawa, JP;

Hajime Sugahara, Kanagawa, JP;

Mieko Seki, Kanagawa, JP;

Kota Nohara, Kanagawa, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03G 9/097 (2006.01);
U.S. Cl.
CPC ...
G03G 9/09725 (2013.01); C01P 2006/14 (2013.01); C01P 2006/16 (2013.01);
Abstract

A silica particle is provided in which a pore size distribution curve obtained by nitrogen gas adsorption of the silica particle after baking at 350° C. has at least one peak at a pore diameter of 2 nm or less and at least one peak at a pore diameter of more than 2 nm and 50 nm or less, and D/B is 0.50 or greater and 2.50 or less, where D and B are the volumes of pores having a diameter of 2 nm or less and a diameter of 2 nm or more and 25 nm or less, respectively, determined from the pore size distribution curve obtained by nitrogen gas adsorption of the silica particle after baking at 350° C.


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