The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 2026
Filed:
Mar. 15, 2023
Shandong University, Jinan, CN;
Shandong Research and Design Institute of Industrial Ceramics Co., Ltd., Zibo City, CN;
Qinghua Song, Jinan, CN;
Xiaojuan Wang, Jinan, CN;
Liping Jiang, Zibo City, CN;
Hongsheng Wang, Zibo City, CN;
Qiang Luan, Zibo City, CN;
Zhanqiang Liu, Jinan, CN;
Yicong Du, Jinan, CN;
SHANDONG UNIVERSITY, Jinan, CN;
SHANDONG RESEARCH AND DESIGN INSTITUTE OF INDUSTRIAL CERAMICS CO., LTD., Zibo, CN;
Abstract
An on-line measurement-error correction device and method for the inner profile of a special-shaped shell, including a fixing device. A vertical moving device is fixed at the top of the fixing device and connected with a horizontal moving device connected with a distance monitoring device, which is movable vertically and horizontally under the drive of the vertical and horizontal moving devices. The distance monitoring device includes a displacement monitoring element fixedly arranged on a fixing support hinged with an electric push rod configured to displace to drive the displacement monitoring element to deflect so as to change a monitoring direction. The displacement monitoring element is driven to deflect by the electric push rod of the distance monitoring device to change a monitoring direction, and a distance between each longitudinal section surface point on the inner surface of the special-shaped shell and the displacement monitoring element can be gradually measured.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile