The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 30, 2026

Filed:

Dec. 09, 2021
Applicants:

Lg Chem, Ltd., Seoul, KR;

Midori Anzen Co., Ltd., Tokyo, JP;

Inventors:

Won Sang Kwon, Daejeon, KR;

Seung UK Yeu, Daejeon, KR;

Jung Su Han, Daejeon, KR;

Jung Eun Kim, Daejeon, KR;

Myung Su Jang, Daejeon, KR;

Norihide Enomoto, Tokyo, JP;

Sayaka Hoshino, Tokyo, JP;

Shoya Satake, Tokyo, JP;

Yamato Takeuchi, Tokyo, JP;

Assignees:

LG CHEM, LTD., Seoul, KR;

MIDORI ANZEN CO., LTD., Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08L 9/04 (2006.01);
U.S. Cl.
CPC ...
C08L 9/04 (2013.01);
Abstract

Disclosed is a dip-formed article comprising a layer derived from a latex composition for dip-forming, wherein the latex composition for dip-forming contains a carboxylic acid-modified nitrile-based copolymer latex, the carboxylic acid-modified nitrile-based copolymer latex contains a carboxylic acid-modified nitrile-based copolymer, and the dip-formed article has an elongation of more than 650% and satisfies the following Expressions 1 and 2,[Expression 1]'≤9.3 N/mm  (1)[Expression 2]0.55≤′/(′)  (2)


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