The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 2026
Filed:
Mar. 28, 2023
Applicant:
Agc Inc., Tokyo, JP;
Inventors:
Satoshi Kanasugi, Tokyo, JP;
Kazutaka Yanagihara, Tokyo, JP;
Hiroshi Komatsu, Tokyo, JP;
Suguru Takayashiki, Tokyo, JP;
Assignee:
AGC INC., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03C 3/087 (2006.01); B60K 35/22 (2024.01); B60K 35/40 (2024.01); B60K 35/50 (2024.01); G02B 1/10 (2015.01);
U.S. Cl.
CPC ...
C03C 3/087 (2013.01); B60K 35/22 (2024.01); B60K 35/415 (2024.01); B60K 35/425 (2024.01); B60K 35/50 (2024.01); G02B 1/10 (2013.01);
Abstract
To suppress reduction in rigidity. A cover material has a curvature in a first direction X and a curvature in a second direction Y. The curvature in the first direction X and the curvature in the second direction Y intersect with each other on a plane of the cover material. The radius of curvature of the curvature in the first direction X is 60 mm or more and 300 mm or less. The radius of curvature of the curvature in the second direction Y is 1000 mm or more and 14000 mm or less.