The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 2026
Filed:
Nov. 16, 2023
Screen Holdings Co., Ltd., Kyoto, JP;
Noritake Sumi, Kyoto, JP;
SCREEN HOLDINGS CO., LTD., , JP;
Abstract
This invention relates a processing chamber cleaning method for a supercritical processing apparatus for accommodating a supporting member supporting a substrate into a processing space of a processing chamber and processing the substrate by a processing fluid in a supercritical state in the processing space. The processing chamber cleaning method includes supporting a flat dish-like container storing a cleaning liquid on the supporting member and accommodating the supporting member into the processing space, filling the processing space with the processing fluid in the supercritical state and discharging the processing fluid. It is capable of effectively cleaning the inside of even a supercritical processing chamber including a processing space having a narrow opening and a large depth.