The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 2026
Filed:
Nov. 27, 2019
Kimberly-clark Worldwide, Inc., Neenah, WI (US);
Antonio J. Carrillo Ojeda, Appleton, WI (US);
Davis Dang H. Nhan, Menasha, WI (US);
Neil T. Scholl, Neenah, WI (US);
Vasily A. Topolkaraev, Appleton, WI (US);
David G. Biggs, New London, WI (US);
Mark M. Mleziva, Appleton, WI (US);
Steven J. Roffers, Neenah, WI (US);
Dustin J. Smith, Green Bay, WI (US);
Kimberly-Clark Worldwide, Inc., Neenah, WI (US);
Abstract
Three dimensional nonwoven materials and methods of manufacturing such materials are disclosed. In one embodiment, a method can include providing a precursor web that includes a plurality of fibers and transferring the precursor web to a forming surface having a plurality of forming holes. The method can also include directing a plurality of pressurized fluid streams of entangling fluid in a direction towards the precursor web on the forming surface to move at least some of the fibers into the plurality of forming holes to create a fluid entangled web. The method can further include removing the fluid entangled web from the forming surface such that the at least some of the fibers moved into the plurality of forming holes provide a plurality of nodes. The plurality of nodes can have an anisotropy value greater than 1.0 as determined by the Node Analysis Test Method.