The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 23, 2026

Filed:

Apr. 02, 2021
Applicant:

Mitsubishi Electric Corporation, Tokyo, JP;

Inventors:

Katsuhiko Kondo, Tokyo, JP;

Takuya Shiratsuru, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/367 (2006.01); H01L 21/48 (2006.01); H01L 23/00 (2006.01); H01L 23/053 (2006.01); H01L 23/373 (2006.01); H10W 40/22 (2026.01); H10W 40/25 (2026.01); H10W 70/02 (2026.01); H10W 76/15 (2026.01); H10W 72/00 (2026.01); H10W 90/00 (2026.01);
U.S. Cl.
CPC ...
H10W 40/22 (2026.01); H10W 40/258 (2026.01); H10W 40/259 (2026.01); H10W 70/02 (2026.01); H10W 76/15 (2026.01); H10W 72/886 (2026.01); H10W 90/734 (2026.01); H10W 90/761 (2026.01);
Abstract

Provided are a semiconductor device capable of reducing damage on a resin case by heating during manufacture and a method of manufacturing a semiconductor device capable of reducing damage on a resin case by heating during manufacture. A semiconductor device includes a base plate, an insulating substrate, a semiconductor element, and a resin case. The base plate includes first and second regions whose positions differ from each other in a plan view. The insulating substrate is bonded on an upper surface of the second region. The insulating substrate includes a circuit pattern on an upper surface. The semiconductor element is bonded on the circuit pattern. The resin case is bonded on an upper surface of the first region. Thermal resistance between the upper surface and a lower surface of the first region is higher than thermal resistance between the upper surface and a lower surface of the second region.


Find Patent Forward Citations

Kondo, Katsuhiko. (2026). Semiconductor device and method of manufacturing semiconductor device (U.S. Patent No. 12666962). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12666962

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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