The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 23, 2026

Filed:

Apr. 24, 2023
Applicant:

Semiconductor Energy Laboratory Co., Ltd., Atsugi, JP;

Inventors:

Yasuhiro Niikura, Tokyo, JP;

Sachiko Kawakami, Atsugi, JP;

Naoaki Hashimoto, Sagamihara, JP;

Yui Yoshiyasu, Atsugi, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10K 50/16 (2023.01); H05B 33/10 (2006.01); H10K 50/13 (2023.01); H10K 59/80 (2023.01); H10K 71/20 (2023.01); H10K 85/60 (2023.01);
U.S. Cl.
CPC ...
H10K 85/6572 (2023.02); H05B 33/10 (2013.01); H10K 50/13 (2023.02); H10K 50/16 (2023.02); H10K 59/805 (2023.02); H10K 71/231 (2023.02);
Abstract

An increase in voltage of a light-emitting device manufactured through a step of forming an aluminum oxide film in contact with an organic compound layer is inhibited. An organic compound film is formed over a first electrode. An organic mask film containing an organic compound which has low solubility to water or a chemical solution including water as a solvent is formed over the organic compound film. An inorganic mask layer is formed over the organic mask film. Shapes of the organic mask film and the organic compound film are processed with the use of the inorganic mask layer, whereby an organic mask layer and an organic compound layer are formed. At least parts of the inorganic mask layer and the organic mask layer are removed with the use of water or a liquid including water as a solvent.


Find Patent Forward Citations

Loading…