The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 23, 2026

Filed:

Jan. 09, 2023
Applicant:

Hon Hai Precision Industry Co., Ltd., New Taipei, TW;

Inventors:

Shih-Chao Chien, New Taipei, TW;

Chin-Pin Kuo, New Taipei, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06V 10/26 (2022.01); G06V 10/764 (2022.01); G06V 10/77 (2022.01); G06V 10/774 (2022.01); G06V 10/82 (2022.01); G06V 20/64 (2022.01);
U.S. Cl.
CPC ...
G06V 10/26 (2022.01); G06V 10/764 (2022.01); G06V 10/7715 (2022.01); G06V 10/7747 (2022.01); G06V 10/82 (2022.01); G06V 20/64 (2022.01);
Abstract

A deep recognition model training method applied to an electronic device is provided. The method includes obtaining a ground plane area by segmenting a first image using a ground plane segmentation network. A projection image of the first image is generated based on the first image, an initial depth image corresponding to the first image, and a pose matrix. A target height loss of a depth recognition network is generated, and a depth loss of the depth recognition network is obtained according to a gradient loss between the initial depth image and the first image and a photometric loss between the projection image and the first image. A depth recognition model is obtained by adjusting the depth recognition network based on the depth loss and the target height loss.


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