The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2026
Filed:
Jun. 12, 2024
Amazon Technologies, Inc., Seattle, WA (US);
Shamit Lal, Seattle, WA (US);
Ying Wang, Bothell, WA (US);
Yusheng Xie, Redwood City, CA (US);
Ashwin Swaminathan, Dublin, CA (US);
AMAZON TECHNOLOGIES, INC., Seattle, WA (US);
Abstract
Techniques are generally described for improved image editing for small masks. A first source image may be received. First mask data identifying first pixels of the first source image may be received. A ratio between a size of the first mask data and the first source image may be below a threshold. A second source image that includes the first pixels of the first source image and second pixels of the first source image that at least partially surround the first pixels may be generated. Upsampled image data may be generated by upsampling the second source image. Upsampled mask data may be generated by upsampling the first mask data. A diffusion-based inpainting model may generate a first inpainted image that includes the upsampled image data inpainted in a region corresponding to the upsampled mask data.