The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2026
Filed:
Jan. 25, 2024
Fujifilm Corporation, Tokyo, JP;
Masato Shirakawa, Haibara-gun, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
A washout processor and a washing method suppress brush marks and development unevenness. The processor includes a unit that performs development by simultaneously performing circular movement and linear reciprocation of a developing brush on the flexographic printing plate precursor. The circular movement and the linear reciprocation of the developing brush satisfy at least one of conditions (a) or (b). Condition (a) when a stop time when switching between directions of the linear reciprocation of the developing brush is t seconds and a rotation speed of the circular movement of the developing brush is R times per second, t<R is satisfied. Condition (b) when the number of times of linear reciprocation per unit time in the linear reciprocation of the developing brush is f times per second and the rotation speed of the circular movement of the developing brush is R times per second, f<R is satisfied.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile