The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2026
Filed:
May. 20, 2021
Applicant:
Georgia Tech Research Corporation, Atlanta, GA (US);
Inventor:
Sourabh Kumar Saha, Atlanta, GA (US);
Assignee:
Georgia Tech Research Corporation, Atlanta, GA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/2055 (2013.01); G03F 7/70 (2013.01);
Abstract
An exemplary optical projection method and system is disclosed, e.g., femtosecond projection two-photon lithography (FP-TPL) based operation, that applies multiple temporally focused light with reduced density of the projected mask to control over-polymerization defects (e.g., without need to tune the photopolymer composition) when certain aspect ratio of the submicron features are desired.
Quick Actions:
Saha, Sourabh. (2026). System and method to control defects in projection-based sub-micrometer additive manufacturing (U.S. Patent No. 12663722). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12663722
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile