The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2026
Filed:
Dec. 28, 2022
Digilens Inc., Sunnyvale, CA (US);
Alastair John Grant, San Jose, CA (US);
Gerald Buxton, Sunnyvale, CA (US);
Hyesog Lee, Sunnyvale, CA (US);
DigiLens Inc., Sunnyvale, CA (US);
Abstract
Disclosed herein is methods and apparatus for recording a holographic waveguide utilizing an inverted holographic master technique. In some embodiments, an apparatus for recording a holographic waveguide is provided. The apparatus may include a source of light configured to provide a recording beam; a master substrate with a non-grating modulated surface and a grating modulated surface, wherein the grating modulated surface is opposite to the non-grating modulated surface and is configured to diffract the recording beam; a bottom substrate with opposing light transmitting surfaces coated with anti-reflection coatings overlaying the grating modulated surface of the substrate and separated from the master substrate by a gap; and an exposure cell containing holographic recording material directly facing the non-grating modulated surface of the master substrate. Advantageously, the inverted holographic master technique mitigates the effects of unwanted reflected exposure light.