The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2026
Filed:
May. 11, 2022
Mitsubishi Electric Research Laboratories, Inc., Cambridge, MA (US);
Mitsubishi Electric Research Laboratories, Inc., Cambridge, MA (US);
Abstract
A computer-implemented method is provided for designing a metalens. The metalens has a metasurface including nano-structures arranged on a substrate based on preliminary simulation data. The method includes partitioning the nano-structures into overlapping d-unit supercells such that every non-perimeter nano-structure is at the center of one d-unit supercell, computing a differentiable mapping function of the d-unit supercells that predicts the near-field over the unit cell at the center of the supercell from the design parameters of all the nanostructures in the supercell, jointly tuning the design parameters of all unit cells in the metalens to better approximate a target near field distribution over the entire metalens, by using a Jacobian of partial derivatives provided by the mapping function to solve for a locally optimal correction of all design parameters, and generating a fabricable design of the metalens based on the optimized parameters.