The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 23, 2026

Filed:

Dec. 30, 2021
Applicant:

Src, Inc., North Syracuse, NY (US);

Inventors:

John C. Dougherty, Liverpool, NY (US);

David L. Weldum, Jamesville, NY (US);

Assignee:

SRC, INC., North Syracuse, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01S 13/04 (2006.01); G01S 7/41 (2006.01);
U.S. Cl.
CPC ...
G01S 13/04 (2013.01); G01S 7/412 (2013.01); G01S 7/414 (2013.01);
Abstract

A method of processing radar responses of a radar system characterized by a plurality of beam patterns, to determine if a given response corresponds to a reflective object. The method including, for a first beam pattern, identifying a response at an identified angle relative to a center of the first beam pattern. Then, for a second beam pattern overlapping the first beam pattern, determining if a measured response in the second beam pattern at an angle relative to the center of the second beam pattern that corresponds to the identified angle relative to the center of the first beam pattern is within a predetermined error threshold of an anticipated response calculated using the second beam pattern and the first beam pattern. If the measured response in the second beam pattern is not within the predetermined error threshold, the first response is eliminated from display and/or further tracking.


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