The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 23, 2026

Filed:

May. 31, 2024
Applicant:

Schlumberger Technology Corporation, Sugar Land, TX (US);

Inventors:

Elena Borisova, Paris, FR;

Pierre Beaudy, Chaville, FR;

Jean Pierre Bailly, Clamart, FR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 30/88 (2006.01); G01N 30/02 (2006.01);
U.S. Cl.
CPC ...
G01N 30/88 (2013.01); G01N 2030/025 (2013.01); G01N 2030/889 (2013.01);
Abstract

A method for quality control checking a gas chromatography apparatus at a rig site, the GC apparatus including at least a main column and a makeup flow line in fluid communication with a detector manifold. The GC apparatus measures a first chromatogram of a gas sample with a first makeup gas flow rate and a second chromatogram of the gas sample with a second makeup gas flow rate, wherein the second makeup gas flow rate is greater than the first makeup gas flow rate. The elution times of at least one common peak in the first and second chromatograms are compared to indicate a leak or an obstruction in the makeup flow line or the detector manifold.


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