The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 23, 2026

Filed:

Sep. 13, 2023
Applicant:

National Central University, Taoyuan City, TW;

Inventor:

Chao-Wen Liang, Taoyuan City, TW;

Assignee:

National Central University, Taoyuan City, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01M 11/02 (2006.01);
U.S. Cl.
CPC ...
G01M 11/0214 (2013.01);
Abstract

A device and method for measuring the decentration of optics under test is provided. The device comprises a rotational spindle for loading and rotating the optics under test, a light source module for providing incident light beam to the optics under test, and a wavefront sensor for receiving testing light beams with different exposures from the optics under test at a plurality of azimuthal directions.


Find Patent Forward Citations

Liang, Chao-Wen. (2026). Optical wavefront measuring device and measuring method thereof (U.S. Patent No. 12663336). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12663336

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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