The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2026
Filed:
Aug. 10, 2022
Virginia Commonwealth University, Richmond, VA (US);
Santiago Vargas Giraldo, Richmond, VA (US);
Carlos Eduardo Castano Londono, Richmond, VA (US);
Virginia Commonwealth University, Richmond, VA (US);
Abstract
Sputtering machines and substrate holders for such systems are described which include one or more magnets apart from the magnets typical of sputtering guns. The added magnets produce a magnetic field bias which is a new means for controlling depositional flux, ionization degree of a sputtered species, and microstructure properties of deposited coatings. An exemplary substrate holder may have a magnet or magnet array near or next to the surface supporting the substrate, and the magnet may assume multiple different magnetic field configurations depending on the desired properties of the resulting magnetic field bias within the reaction chamber.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile