The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2026
Filed:
May. 25, 2022
Riken Technos Corporation, Tokyo, JP;
Kohei Nakashima, Tokyo, JP;
Taketo Hashimoto, Tokyo, JP;
RIKEN TECHNOS CORPORATION, Tokyo, JP;
Abstract
The present invention is a composite film manufacturing method in which a sputtering device is used and a gas of a substance with which can be prepared a mixed gas of a target of a solid substance in a standard state (a temperature of 25° C. and pressure of 100 KPa) (A) and a sputtering gas (B) is used. The method includes: (1) a step for attaching the target (A) to a target installation jig of the sputtering device; (2) a step for reducing the pressure inside a sputtering chamber of the sputtering device to a prescribed first pressure; (3) a step for introducing the mixed gas of the sputtering gas and the gas (B) into the sputtering chamber of the sputtering device such that the inside of the sputtering chamber reaches a second prescribed pressure (greater than or equal to the first prescribed pressure); and (4) a step for applying electric power to the target (A) and using sputtering to form a composite film on the surface of a base material. The sputtering device may be a roll-to-roll scheme sputtering device.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile