The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2026
Filed:
Jul. 27, 2021
Applicant:
Tosoh Corporation, Shunan, JP;
Inventors:
Assignee:
TOSOH CORPORATION, Shunan, JP;
Primary Examiner:
Int. Cl.
CPC ...
C04B 35/575 (2006.01); C04B 35/58 (2006.01); C04B 35/626 (2006.01); C23C 14/34 (2006.01);
U.S. Cl.
CPC ...
C04B 35/575 (2013.01); C04B 35/58092 (2013.01); C04B 35/62695 (2013.01); C23C 14/3414 (2013.01);
Abstract
An object of the present invention is to provide a high-density Cr—Si—C-based sintered body including chromium (Cr), silicon (Si) and carbon (C) and is furthermore to provide at least one of the high-density Cr—Si—C-based sintered body, a sputtering target including the sintered body or a method for producing a film using the sputtering target. The present invention can provide a Cr—Si—C-based sintered body including chromium (Cr), silicon (Si) and carbon (C), wherein the sintered body has a relative density of 90% or more and a porosity of 13% or less.