The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2026
Filed:
Aug. 22, 2022
Applicants:
Agc Inc., Tokyo, JP;
Agc Si-tech Co., Ltd., Kitakyushu, JP;
Inventors:
Assignees:
AGC Inc., Tokyo, JP;
AGC SI-TECH CO., LTD., Kitakyushu, JP;
Primary Examiner:
Int. Cl.
CPC ...
C01B 33/18 (2006.01); C09C 1/30 (2006.01);
U.S. Cl.
CPC ...
C01B 33/18 (2013.01); C09C 1/3027 (2013.01); C09C 1/3081 (2013.01); C01P 2002/82 (2013.01); C01P 2004/34 (2013.01); C01P 2004/61 (2013.01); C01P 2004/64 (2013.01); C01P 2006/10 (2013.01); C01P 2006/12 (2013.01); C01P 2006/14 (2013.01);
Abstract
The present invention relates to hollow silica particles, which each includes a shell layer containing silica and a space inside the shell layer, in which the hollow silica particles have a peak intensity derived from SiOH at a wavenumber of around 3,746 cmof 0.60 or less by infrared spectroscopy, a relative permittivity at 1 GHz of from 1.3 to 5.0 and a dielectric loss tangent at 1 GHz of from 0.0001 to 0.05.
Kamo, Hiromichi. (2026). Hollow silica particles and method for producing the same (U.S. Patent No. 12662386). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12662386
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile