The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2026
Filed:
Sep. 30, 2022
Honeywell International Inc., Charlotte, NC (US);
Mehrad Mehr, Morristown, NJ (US);
Bahram Jadidian, Watchung, NJ (US);
Honeywell International Inc., Charlotte, NC (US);
Abstract
A thermal process system includes a retort assembly that includes a retort chamber, a heating assembly configured to heat the retort chamber, a vessel housing, a process gas inlet, and a sealing gas inlet. The retort assembly is configured to substantially contain one or more process gases in the retort chamber during a thermal process. The vessel housing is positioned around the retort chamber and configured to maintain a pressure or vacuum within the retort chamber. The process gas inlet is configured to receive the one or more process gases into the retort assembly. The sealing gas inlet is configured to receive a sealing gas into the vessel housing. The thermal process system may further include a leak gas detector configured to detect a presence of a leak gas, in which the leak gas includes a gas that is not the one or more process gases in the retort chamber.