The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 23, 2026

Filed:

Oct. 12, 2021
Applicant:

3m Innovative Properties Company, St. Paul, MN (US);

Inventors:

Timothy J. Hebrink, Scandia, MN (US);

John A. Wheatley, Stillwater, MN (US);

Bharat R. Acharya, Woodbury, MN (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
A61L 2/26 (2006.01); A61L 2/10 (2026.01); B32B 27/08 (2006.01); B32B 27/18 (2006.01); B32B 27/30 (2006.01); G02B 1/04 (2006.01); G02B 5/08 (2006.01); G02B 5/20 (2006.01); H01J 61/02 (2006.01);
U.S. Cl.
CPC ...
A61L 2/26 (2013.01); A61L 2/10 (2013.01); B32B 27/08 (2013.01); B32B 27/18 (2013.01); B32B 27/304 (2013.01); G02B 1/04 (2013.01); G02B 5/0891 (2013.01); G02B 5/208 (2013.01); H01J 61/025 (2013.01); A61L 2202/11 (2013.01); B32B 2255/10 (2013.01); B32B 2255/20 (2013.01); B32B 2255/28 (2013.01); B32B 2264/1022 (2020.08); B32B 2551/00 (2013.01);
Abstract

Multilayer articles are provided, including an absorbent layer and an ultraviolet mirror containing at least a plurality of alternating first and second optical layers. The absorbent layer absorbs ultraviolet light having a wavelength between at least 230 nanometers (nm) and 400 nm. The ultraviolet mirror reflects ultraviolet light in a wavelength range from 190 nm to 240 nm. Systems are also provided including a broadband UVC light source and a multilayer article. Devices are provided including a chamber, a broadband UVC light source located within the chamber, an absorbent layer in the chamber, and an ultraviolet mirror between the light source and absorbent layer. Methods of disinfecting a material are further provided, including obtaining a system or device, directing UVC light at the ultraviolet mirror, and exposing the material to ultraviolet light in a wavelength range from 190 nm to 240 nm, reflected by the ultraviolet mirror towards the material.


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