Semiconductor memory device and manufacturing method of semiconductor memory device

Abstract

There are provided a semiconductor memory device and a manufacturing method of a semiconductor memory device. The semiconductor memory device includes: a peripheral circuit layer; a bonding structure disposed on the peripheral circuit layer; a channel structure disposed on the bonding structure; a first gate contact structure including a first vertical part penetrating the bonding structure and a first horizontal part intersecting with the first vertical part and extending from the first vertical part; and a first gate conductive pattern in contact with a sidewall of the first horizontal part, the first gate conductive pattern being spaced apart from the first vertical part, the first gate conductive pattern extending to surround the channel structure.