The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 16, 2026

Filed:

Oct. 19, 2023
Applicant:

Semes Co., Ltd., Chungcheongnam-do, KR;

Inventors:

Yong Jun Seo, Gyeonggi-do, KR;

Su Jin Chae, Gyeonggi-do, KR;

Sang Hyun Son, Busan, KR;

Sang Min Ha, Gyeonggi-do, KR;

Young Sik Bang, Gyeonggi-do, KR;

Jeong Mo Hwang, Gyeonggi-do, KR;

Dong Ok Ahn, Gyeonggi-do, KR;

Assignee:

SEMES CO., LTD., Chungcheongnam-do, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01F 1/684 (2006.01); G01F 1/688 (2006.01); G01F 1/696 (2006.01); H10P 74/00 (2026.01);
U.S. Cl.
CPC ...
H10P 74/277 (2026.01); G01F 1/6845 (2013.01); G01F 1/6888 (2013.01); G01F 1/6965 (2013.01);
Abstract

An apparatus and method for measuring air currents on the surface of a substrate, which can accurately measure the magnitude and direction of air currents on the surface of a wafer with wafer-type air current measurement sensors, are provided. The apparatus includes: a first air current measurement module measuring a magnitude of air currents on a surface of a first substrate, which is processed in accordance with a semiconductor manufacturing process; a second air current measurement module measuring a movement direction of the air currents; and a power module supplying power to the first and second air current measurement modules, wherein the first air current measurement module, the second air current measurement module, and the power module are mounted on a second substrate, which has the same shape as the first substrate.


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