The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2026
Filed:
Aug. 13, 2024
Applicant:
Sumitomo Heavy Industries Ion Technology Co., Ltd., Tokyo, JP;
Inventor:
Taisei Futakuchi, Ehime, JP;
Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/302 (2006.01); H01J 37/317 (2006.01); H10P 30/20 (2026.01);
U.S. Cl.
CPC ...
H01J 37/3023 (2013.01); H01J 37/3171 (2013.01); H10P 30/20 (2026.01);
Abstract
An ion implanter includes a high energy multi-stage linear acceleration unit including a plurality of linear acceleration units, wherein each of the linear acceleration units includes high frequency accelerators respectively in a plurality of stages; and a control device controlling an operation of the high energy multi-stage linear acceleration unit in accordance with a data set defining a voltage amplitude, a frequency, and a phase of the high frequency accelerator in each of the plurality of stages.
Quick Actions:
Futakuchi, Taisei. (2026). Ion implanter and ion implantation method (U.S. Patent No. 12658404). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12658404
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile