The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2026
Filed:
May. 27, 2021
Applicant:
Hitachi High-tech Corporation, Tokyo, JP;
Inventors:
Assignee:
Hitachi High-Tech Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/08 (2006.01); H01J 37/04 (2006.01); H01J 37/30 (2006.01); H01J 37/305 (2006.01);
U.S. Cl.
CPC ...
H01J 37/08 (2013.01); H01J 37/045 (2013.01); H01J 37/3053 (2013.01); H01J 2237/04735 (2013.01); H01J 2237/24585 (2013.01);
Abstract
In a state in which an ion beam from an ion sourceis shielded by a shutter, an ion milling apparatus applies a discharge voltage Vd between an anodeand cathodesandand an acceleration voltage Va between the anode and an acceleration electrodewith respect to the ion source, and retracts the shutter by a shutter drive sourceto a position where the ion beam is not shielded after any one of a discharge current flowing between the anode and the cathodes due to discharge and an ion beam current flowing caused by irradiation on the shutter the ion beam falls below a predetermined reference value.