Integrated circuit device

Abstract

An integrated circuit device includes a substrate having a cell array area, a peripheral circuit area including a core area, and an interface area between the cell array area and the core area, a cell device isolation film defining cell active regions in the cell array area and having a first depth in a vertical direction, peripheral device isolation films defining peripheral active regions in the peripheral circuit area and each having a second depth greater than the first depth in the vertical direction, an interface device isolation film in the interface area of the substrate, and an active dam surrounding the cell array area, wherein at least a first portion of the active dam is in the core area, and at least a second portion of the active dam is apart from the cell array area with the interface device isolation film therebetween.