The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2026
Filed:
Feb. 29, 2024
Tencent Technology (Shenzhen) Company Limited, Shenzhen, CN;
Binjie Zhang, Shenzhen, CN;
Yixiao Ge, Shenzhen, CN;
Shupeng Su, Shenzhen, CN;
Xuyuan Xu, Shenzhen, CN;
Yexin Wang, Shenzhen, CN;
Ying Shan, Shenzhen, CN;
Tencent Technology (Shenzhen) Company Limited, Shenzhen, CN;
Abstract
In a feature extraction model processing method, a sample image and an inheritance parameter of the sample image are obtained. The inheritance parameter is based on feature distinctiveness of a first image feature of the sample image. The first image feature is extracted from the sample image. A second image feature extracted from the sample image is obtained. A classification result of a first classification that is based on the second image feature is obtained. A classification loss of the first classification is adjusted based on the inheritance parameter to obtain a model compatibility loss. A classification loss of a second classification is determined. Respective model parameters of a feature extraction model to be trained and a image classification model to be trained are updated based on the model compatibility loss and the classification loss of the second classification.