The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 16, 2026

Filed:

Sep. 28, 2023
Applicant:

Orbbec Inc., Guangdong, CN;

Inventors:

Shaoguang Shi, Shenzhen, CN;

Zejia Huang, Shenzhen, CN;

Dingjun Zhang, Shenzhen, CN;

Longye Jiang, Shenzhen, CN;

Wei Li, Shenzhen, CN;

Assignee:

Orbbec Inc., Shenzhen, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06T 5/50 (2006.01); G06T 5/20 (2006.01); G06V 10/143 (2022.01); G06V 10/44 (2022.01); G06V 10/60 (2022.01); G06V 40/16 (2022.01); G06V 40/40 (2022.01);
U.S. Cl.
CPC ...
G06T 5/50 (2013.01); G06T 5/20 (2013.01); G06V 10/143 (2022.01); G06V 10/44 (2022.01); G06V 10/60 (2022.01); G06V 40/40 (2022.01); G06T 2207/10036 (2013.01);
Abstract

A method for manufacturing an image sensor, includes: obtaining feature parameter sets of filters corresponding to different wavelengths in a filter unit set, where the image sensor includes at least one filter unit set, the image sensor is manufactured in one of candidate manufacturing methods, and the feature parameter sets correspond to the candidate manufacturing methods; inputting the feature parameter sets of the filters and a preset parameter set into a feature vector conversion model, to obtain feature vectors based on detection targets; inputting the feature vectors into a detection model corresponding to an application scenario type associated with the image sensor, and calculating a corresponding detection accuracy; and selecting a feature parameter set of a filter unit set corresponding to a highest detection accuracy corresponding to the candidate manufacturing methods, and using a candidate manufacturing method corresponding to the selected feature parameter set as an initial manufacturing method of the image sensor.


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