The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2026
Filed:
Aug. 03, 2022
Ionq, Inc., College Park, MD (US);
Kevin Antony Landsman, Rockville, MD (US);
Aleksey Blinov, Evanston, IL (US);
Shantanu Debnath, Lanham, MD (US);
Vandiver Chaplin, Brooklyn, NY (US);
Kristin Marie Beck, Livermore, CA (US);
Andrew Maps Ducore, College Park, MD (US);
Melissa Jameson, Arlington, VA (US);
Jason Hieu Van Nguyen, Hyattsville, MD (US);
Felix Tripier, Washington, DC (US);
IonQ, Inc., College Park, MD (US);
Abstract
Techniques to address the problem of having micromotion and stray fields affect trapped ions and the operation of QIP systems based on trapped ions are described. For example, one technique or approach may involve collecting scattered photons off the ions using a resonant or near-resonant oscillating electric field (e.g., a laser beam or a microwave source) with some projection in the axis or direction of micromotion that one wishes to reduce. Another technique or approach may include raising and lowering the trapping potentials to see how the ion position changes. The information collected from these techniques may be used to provide appropriate adjustments. Accordingly, the present disclosure describes methods, scripts, or techniques that minimize the effects of micromotion.