The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2026
Filed:
Jun. 07, 2021
Danmarks Tekniske Universitet, Kongens Lyngby, DK;
Henning Friis Poulsen, Kongens Lyngby, DK;
Ulrik Lund Olsen, Kongens Lyngby, DK;
DANMARKS TEKNISKE UNIVERSITET, Kongens Lyngby, DK;
Abstract
A method and apparatus for X-ray diffraction analysis of amorphous and/or semi-crystalline materials is able to provide the internal strain map of at least the exposed region of the material, even in the amorphous regions of the material. This is achieved in part by providing several unique and novel analysis methods that are able to extract material properties of semi-crystalline and amorphous materials based on the amorphous diffraction signal. The ability to analyse the amorphous diffraction signal is further facilitated by the use of one or more state-of-the-art energy dispersive detectors, which the inventors have found especially suitable for this purpose. This further allows the use of a polychromatic X-ray source as opposed to the monochromatic X-ray sources typically encountered in X-ray diffraction experiments.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile