The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 16, 2026

Filed:

Sep. 26, 2022
Applicant:

Topcon Corporation, Tokyo, JP;

Inventor:

Takeshi Kikuchi, Tokyo, JP;

Assignee:

TOPCON CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01C 15/00 (2006.01); G01B 17/08 (2006.01); G01C 15/04 (2006.01); G01S 17/42 (2006.01);
U.S. Cl.
CPC ...
G01C 15/006 (2013.01); G01B 17/08 (2013.01); G01C 15/04 (2013.01); G01S 17/42 (2013.01);
Abstract

An unevenness level inspecting device includes a target T at a known distance from a to-be-inspected surface, a traveling unit for traveling on the to-be-inspected surface, a first marker for marking information on the to-be-inspected surface, and a control unit configured to control the first marker, and the control unit calculates a height of the to-be-inspected surface at a measurement position of the target T based on three-dimensional position coordinates of the target input each time the unevenness level inspecting device travels a predetermined distance, and controls the first marker so as to mark unevenness level information indicating a difference between the height of the to-be-inspected surface and a reference height on a corresponding position on the to-be-inspected surface, and the unevenness level information is marked in a color that differs depending on a magnitude of the difference between the height of the to-be-inspected surface and the reference height.


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Kikuchi, Takeshi. (2026). Unevenness level inspecting device, unevenness level inspectiing system, and unevenness level inspecting method (U.S. Patent No. 12656114). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12656114

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