The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2026
Filed:
May. 08, 2024
Applicant:
Ckd Corporation, Aichi, JP;
Inventors:
Masaki Yoshida, Aichi, JP;
Yoshifumi Nishio, Aichi, JP;
Takayuki Kumagai, Aichi, JP;
Shigenobu Nishida, Aichi, JP;
Assignee:
CKD Corporation, Aichi, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F04B 43/00 (2006.01); B32B 27/08 (2006.01); B32B 27/30 (2006.01); F04B 19/00 (2006.01); F04B 43/02 (2006.01); F04B 43/06 (2006.01); F16J 3/02 (2006.01); H10P 72/00 (2026.01);
U.S. Cl.
CPC ...
F04B 43/0054 (2013.01); B32B 27/08 (2013.01); B32B 27/306 (2013.01); F04B 19/006 (2013.01); F04B 43/009 (2013.01); F04B 43/02 (2013.01); F04B 43/06 (2013.01); F16J 3/02 (2013.01); H10P 72/0402 (2026.01);
Abstract
A diaphragm to be used in a chemical flow control device that controls a flow of a chemical in a semiconductor manufacturing process and to which a pressure of a working gas is applied. The diaphragm includes a membrane portion and a permeation reduction layer. The membrane portion is made of fluoroplastic that is resistant to the chemical. The permeation reduction layer is less likely to pass the working gas in comparison to the membrane portion and disposed on a surface of the membrane portion to which the pressure of the working gas is applied.