The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2026
Filed:
Sep. 12, 2024
Applicant:
Agc Inc., Tokyo, JP;
Inventors:
Hiroshi Watanabe, Tokyo, JP;
Yoji Yasui, Tokyo, JP;
Assignee:
AGC Inc., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
B32B 15/04 (2006.01); B32B 9/00 (2006.01); B32B 17/06 (2006.01); B32B 37/24 (2006.01);
U.S. Cl.
CPC ...
B32B 15/04 (2013.01); B32B 9/007 (2013.01); B32B 37/24 (2013.01); B32B 2037/246 (2013.01); B32B 2250/04 (2013.01); B32B 2307/7376 (2023.05); B32B 2311/12 (2013.01); B32B 2311/22 (2013.01); B32B 2311/24 (2013.01); B32B 2313/04 (2013.01); B32B 2315/02 (2013.01);
Abstract
The present invention relates to a composite substrate for graphene film production, the composite substrate including: a substrate having a thermal expansion coefficient of 2.0×10(K) or less; an oxide film; and a metal film containing Cu or Ni, in this order, in which a prescribed diffraction peak is observed by XRD measurement for the metal film by a θ-2θ method, and in a chart obtained by the XRD measurement, a diffraction peak derived other than the prescribed diffraction peak is not observed, or an intensity of diffraction peak other than the prescribed diffraction peak is 1/10 or less of an intensity of the prescribed diffraction peak.