The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 16, 2026

Filed:

Nov. 16, 2022
Applicant:

Derrick Corporation, Buffalo, NY (US);

Inventors:

Michael Joseph Schwec, Boston, NY (US);

David Joseph Holewka, West Seneca, NY (US);

Assignee:

Derrick Corporation, Buffalo, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B04B 11/04 (2006.01); B04B 15/00 (2006.01);
U.S. Cl.
CPC ...
B04B 11/04 (2013.01); B04B 15/00 (2013.01);
Abstract

The present disclosure relates to baffle assemblies, nozzles, and related systems and methods for handling solid discharges of centrifuge separators. In one implementation, a two-piece baffle assembly configured to be positioned around discharge nozzles of a centrifuge separator includes a first segment and a second segment configured to attach to the first segment. The first segment includes a first baffle, a second baffle, and a first discharge gap formed between the first baffle and the second baffle. The second segment includes a frame having an arcuate shape, a third baffle extending inwardly relative to the arcuate frame, a fourth baffle extending inwardly relative to the arcuate frame, and a second discharge gap formed between the third baffle and the fourth baffle.


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